Mixed-mode optical proximity correction

Details Mixed-mode optical proximity correction Mixed-mode optical proximity correction

2006-04-04

2006-04-04

Garbowski, Leigh M. (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000

Reexamination Certificate

active

07024655

ABSTRACT:
A mask is prepared by processing design data with various combinations of rule-based and model-based optical proximity correction. In one embodiment, the design data is first processed with a set of optical proximity correction rules to produce a rule-corrected design. The rule-corrected design is examined to identify a set of features to process with model-based optical proximity correction. Then, the set of features are processed with the model-based optical proximity correction.

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Asai, N

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