Polymers, resist compositions and patterning process

Details Polymers, resist compositions and patterning process Polymers, resist compositions and patterning process

2006-07-18

2006-07-18

Schilling, Richard L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S320000, C430S322000, C430S325000, C430S326000, C430S327000, C430S905000, C430S910000, C430S914000, C526S243000, C526S281000, C526S282000, C526S286000, C526S287000

Reexamination Certificate

active

07078147

ABSTRACT:
A resist composition comprising a base polymer having sulfone or sulfonate units introduced therein is sensitive to high-energy radiation below 300 nm, is endowed with excellent adherence to substrates while maintaining transparency, and is suited for lithographic microprocessing.

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