Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2006-03-21

2006-03-21

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S055000, C355S072000

Reexamination Certificate

active

07016016

ABSTRACT:
A lithographic apparatus patterns a projection beam of radiation using a patterning system. A substrate is supported on a substrate table and the patterned beam is projected onto the substrate on the table. A substrate displacement control system displaces the substrate relative to the table and the projection system in a predetermined direction, such that the patterned beam is scanned across the substrate. The position of the substrate relative to the table and the patterned beam is determined by the displacement control system. The displacement control system comprises at least one component that is displaceable with the substrate and a positioning apparatus to place that component in contact with the substrate, such that the component is displaced with the substrate as the projection beam is scanned across the substrate and such that the component is lifted from the substrate after the projection beams has been scanned across the substrate. The component could be, for example, an elongate strip carrying alignment marks or a magnet which is used to apply a displacement force to the substrate.

REFERENCES:
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5500736 (1996-03-01), Koitabashi et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5530482 (1996-06-01), Gove et al.
patent: 5579147 (1996-11-01), Mori et al.
patent: 5640243 (1997-06-01), Koitabashi et al.
patent: 5677703 (1997-10-01), Bhuva et al.
patent: 5691541 (1997-11-01), Ceglio et al.
patent: 5808797 (1998-09-01), Bloom et al.
patent: 5982553 (1999-11-01), Bloom et al.
patent: 6060224 (2000-05-01), Sweatt et al.
patent: 6133986 (2000-10-01), Johnson
patent: 6151120 (2000-11-01), Matsumoto et al.
patent: 6177980 (2001-01-01), Johnson
patent: 6687041 (2004-02-01), Sandstrom
patent: 6747783 (2004-06-01), Sandstrom
patent: 6795169 (2004-09-01), Tanaka et al.
patent: 6806897 (2004-10-01), Kataoka et al.
patent: 6811953 (2004-11-01), Hatada et al.
patent: 2004/0041104 (2004-03-01), Liebregts et al.
patent: 2004/0130561 (2004-07-01), Jain
patent: 1 482 375 (2004-12-01), None
patent: WO 98/33096 (1998-07-01), None
patent: WO 98/38597 (1998-09-01), None

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