Method of etching a magnetic material

Details Method of etching a magnetic material Method of etching a magnetic material

2006-09-12

2006-09-12

Goudreau, George A. (Department: 1763)

Semiconductor device manufacturing: process

Having magnetic or ferroelectric component

C438S704000, C438S717000, C438S734000, C438S749000, C134S001200, C134S001300

Reexamination Certificate

active

07105361

ABSTRACT:
A method of patterning a layer of magnetic material to form isolated magnetic regions. The method forms a mask on a film stack comprising a layer of magnetic material such that the protected and unprotected regions are defined. The unprotected regions are etched in a high temperature environment to form isolated magnetic regions.

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