Systems and methods for forming metal-doped alumina

Details Systems and methods for forming metal-doped alumina Systems and methods for forming metal-doped alumina

2006-01-10

2006-01-10

Smith, Matthew (Department: 2825)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S778000

Reexamination Certificate

active

06984592

ABSTRACT:
A method of forming (and an apparatus for forming) a metal-doped aluminum oxide layer on a substrate, particularly a semiconductor substrate or substrate assembly, using a vapor deposition process.

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