Photosensitive bottom anti-reflective coatings

Details Photosensitive bottom anti-reflective coatings Photosensitive bottom anti-reflective coatings

2006-09-19

2006-09-19

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S271100, C430S325000, C430S326000, C430S330000, C526S092000, C428S412000, C428S423100

Reexamination Certificate

active

07108958

ABSTRACT:
Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. Preferred polymers include polycarbonates, polysulfonyl esters, polycarbonate sulfones, and mixtures thereof. The compositions can be applied to a silicon wafer or other substrate to form a cured or hardened layer which is initially insoluble in typical photoresist developing solutions. Upon exposure to light, the cured or hardened layers become soluble in photoresist developing solutions so that the layer can be selectively removed along with the developed photoresist layer, thus eliminating the need for a separate removal step.

REFERENCES:
patent: 3615615 (1971-10-01), Lincoln et al.
patent: 3856751 (1974-12-01), Wilson
patent: 4175175 (1979-11-01), Johnson et al.
patent: 4320224 (1982-03-01), Rose et al.
patent: 4996247 (1991-02-01), Nelson et al.
patent: 5554473 (1996-09-01), Cais et al.
patent: 5691101 (1997-11-01), Ushirogouchi et al.
patent: 5739254 (1998-04-01), Fuller et al.
patent: 6054254 (2000-04-01), Sato et al.
patent: 6071662 (2000-06-01), Carmichael et al.
patent: 6110653 (2000-08-01), Holmes et al.
patent: 6319649 (2001-11-01), Kato et al.
patent: 6319651 (2001-11-01), Holmes et al.
patent: 6338936 (2002-01-01), Ichikawa et al.
patent: 6359028 (2002-03-01), Miya et al.
patent: 6576409 (2002-08-01), Ichikawa et al.
patent: 6451498 (2002-09-01), Pirri et al.
patent: 6586560 (2003-07-01), Chen et al.
patent: 6740469 (2004-05-01), Krishnamurthy et al.
patent: 6838223 (2005-01-01), Yoon et al.
patent: 6844131 (2005-01-01), Oberlander et al.
patent: 2002/0009599 (2002-01-01), Welch et al.
patent: 2003/0129531 (2003-07-01), Oberlander et al.
patent: 2003/0129547 (2003-07-01), Neisser et al.
patent: 2003/0166828 (2003-09-01), Cox et al.
patent: 2003/0215736 (2003-11-01), Oberlander et al.
patent: 2004/0018451 (2004-01-01), Choi
patent: 2004/0058275 (2004-03-01), Neef et al.
patent: 2004/0077173 (2004-04-01), Sivakumar
patent: WO 2004/113417 (2004-12-01), None
Synthesis and Characterizations of Photodefinable Polycarbonates for use as Sacrificial Materials in the Fabrication of Microfludic Devices, White et al., S.P.I.E. Proc., vol. 4690, p. 242 (2002).
Removable Organic Antireflective Coating, Sturtevant et al., S.P.I.E., vol. 2724 pp. 738-746 (1996).
Compatibility of Chemically Amplified Photoresist with Bottome Anti-Reflective Coatings, Yoshino, et al., S.P.I.E., vol. 3333, pp. 655-665 (1998).

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