Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2006-04-18
2006-04-18
Geyer, Scott (Department: 2812)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
Reexamination Certificate
active
07030040
ABSTRACT:
A surface may be selectively coated with a polymer using an induced surface grafting or polymerization reaction. The reaction proceeds in those regions that are polymerizable and not in other regions. Thus, a semiconductor structure having organic regions and metal regions exposed, for example, may have the organic polymers formed selectively on the organic regions and not on the unpolymerizable or metal regions.
REFERENCES:
patent: 6670286 (2003-12-01), Yang et al.
Goodner Michael D.
Kloster Grant
Geyer Scott
Intel Corporation
Trop Pruner & Hu P.C.
LandOfFree
Selectively growing a polymeric material on a semiconductor... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Selectively growing a polymeric material on a semiconductor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Selectively growing a polymeric material on a semiconductor... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3532201