Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-08-02
2005-08-02
Hamilton, Cynthia (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S326000, C430S296000, C430S018000, C430S942000, C526S268000, C526S281000
Reexamination Certificate
active
06924078
ABSTRACT:
Photoresist monomers, polymers thereof, photoresist compositions containing the same for preventing acid generated in the exposed area during the course of a photolithography process from being diffused to the unexposed area. The line edge roughness and slope pattern are improved when an ultrafine photoresist pattern is formed using photoresist copolymer having a multi-oxygen-containing compound as a repeating unit such as an ethyleneoxy moiety represented by Formula 1 with at least one polymerizable carbon-carbon double bond. In addition, the shape of pattern is improved by eliminating top loss and the adhesion of pattern to the substrate is improved.wherein n is an integer ranging from 1 to 5.
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Choi Se Jin
Jung Jae Chang
Kim Deog Bae
Kim Jae Hyun
Lee Geun Su
Dongjin Semichem Co., Ltd.
Hamilton Cynthia
Hynix / Semiconductor Inc.
Marshall & Gerstein & Borun LLP
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