Method and apparatus for processing substrates and method...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

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C438S264000, C118S719000

Reexamination Certificate

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06927165

ABSTRACT:
A substrate processing apparatus includes a housing, a process tube for performing variable batch processes on substrates, and product substrate carriers. The product substrate carriers have a capacity of a predetermined number of substrates. A number of the product substrates processed during one batch process are less than or equal to the predetermined number of the substrates. All of the product substrates contained in one product substrate carrier is processed in the process tube at a same time.

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patent: 5062771 (1991-11-01), Satou et al.
patent: 5447294 (1995-09-01), Sakata et al.
patent: 5462397 (1995-10-01), Iwabuchi
patent: 6331890 (2001-12-01), Marumo et al.
patent: 6638860 (2003-10-01), Matsunaga et al.
patent: 6641350 (2003-11-01), Nakashima et al.

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