Method of designing wiring structure of semiconductor device...

Details Method of designing wiring structure of semiconductor device... Method of designing wiring structure of semiconductor device...

2005-12-20

2005-12-20

Smith, Matthew (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C716S030000, C326S015000, C326S021000, C326S101000, C257S635000, C257S649000

Reexamination Certificate

active

06978434

ABSTRACT:
A wiring structure of a semiconductor device, includes a wiring layer formed on an insulating film, a width (W) of each wire in the wiring layer and a thickness (H) of the insulating film satisfying “W/H<1” a length (L) of each wiring in the wiring layer being equal to or longer than 1 mm.

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