Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-12-27
2005-12-27
Smith, Matthew (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000
Reexamination Certificate
active
06981241
ABSTRACT:
In order to eliminate phase conflicts in alternating phase masks, the layout is modified after the phase conflicts have been localized. During the modification, degenerate critical structures, which fall below a minimum width and require phase-shifting regions for their adequate imaging, are widened, so that the phase-shifting regions directly adjoining the degenerate critical structures disappear. Moreover, interaction regions between phase-shifting regions can be eliminated by trimming masks, intermediate phases or shifting associated critical structures.
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Ludwig Burkhard
Moukara Molela
Infineon - Technologies AG
Levin Naum
Smith Matthew
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