Methods and apparatus for in situ substrate temperature...

Thermal measuring and testing – Thermal calibration system

Reexamination Certificate

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C374S141000, C374S121000, C374S179000, C356S045000, C427S008000, C438S009000, C438S016000, C156S345270

Reexamination Certificate

active

06976782

ABSTRACT:
In a plasma processing system, a method of determining the temperature of a substrate is disclosed. The method includes positioning the substrate on a substrate support structure, wherein the substrate support structure includes a chuck. The method further includes creating a temperature calibration curve for the substrate, the temperature calibration curve being created by measuring at least a first substrate temperature with an electromagnetic measuring device, and measuring a first chuck temperature with a physical measuring device during a first isothermal state. The method also includes employing a measurement from the electromagnetic measurement device and the temperature calibration curve to determine a temperature of the substrate during plasma processing.

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