Positive resist composition

Details Positive resist composition Positive resist composition

2005-02-08

2005-02-08

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S907000

Reexamination Certificate

active

06852467

ABSTRACT:
A positive resist composition comprising:(A) a fluorine group-containing resin having: a structure wherein at least one of the main chain and the side chain of the polymer skeleton has at least one fluorine atom; and having a group capable of decomposing under the action of an acid to increase the solubility in an alkali developer;(B) a compound capable of generating an acid upon irradiation with one of actinic ray and radiation, and(C) a surfactant containing at least one of a silicon atom and a fluorine atom.

REFERENCES:
patent: 5693452 (1997-12-01), Aoai et al.
patent: 6087064 (2000-07-01), Lin et al.
patent: 6100004 (2000-08-01), Elsaesser et al.
patent: 6265135 (2001-07-01), Kodama et al.
patent: 6461791 (2002-10-01), Hatakeyama et al.
patent: 2 356 258 (2001-05-01), None
patent: WO 0067072 (2000-11-01), None
Kim, US 2002/0177067 A1, Nov. 2002 for U.S. Appl. No. 09/947,582 filed Sep. 2001.

Affiliated with

Also associated with

Rating

Positive resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3511246