Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Patent
1997-11-07
1998-08-25
Codd, Bernard P.
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
430 30, 430394, G03F 722
Patent
active
057981957
ABSTRACT:
In a stepping accuracy measuring method according to the present invention, LIA measuring marks are successively exposed to shot areas on a wafer as reticle pattern images. In a first measurement, positions of the LIA measuring marks on respective shot areas are detected in a predetermined sequence, thereby monitoring coordinate values of a wafer stage on which the wafer is rested by means of a laser interferometer. Thereafter, in a second measurement, the positions of the LIA measuring marks on the shot areas are detected in a sequence different from the above-mentioned predetermined sequence, for instance, thereby monitoring coordinate values of the wafer stage by means of the laser interferometer. A stepping error is determined on the basis of a difference between the results obtained in the first measurement and the results obtained in the second measurement. In a stage accuracy evaluation method according to the present invention, an alignment error between adjacent shot areas is measured by a vernier evaluation method. By separating a linear error component comprised of scaling values, degree of perpendicularity, rotation and offset from such an alignment error, a non-linear error component is determined. An error component caused by yawing of the wafer stage and an error component caused by distortion of movable mirrors of the laser interferometer are extracted.
REFERENCES:
patent: 5362585 (1994-11-01), Adams
patent: 5468580 (1995-11-01), Tanaka
patent: 5543256 (1996-08-01), Shinoda et al.
Codd Bernard P.
Nikon Corporation
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