Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2005-06-28
2005-06-28
Flynn, Nathan J. (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S328000, C257S339000
Reexamination Certificate
active
06911692
ABSTRACT:
A MOS semiconductor device includes n−-type surface regions, which are extended portions of an n−-type drift layer12extended to the surface of the semiconductor chip. Each n−-type surface region14is shaped with a stripe surrounded by a p-type well region. The surface area ratio between n−-type surface regions14and p-type well region13including an n+-type region15is from 0.01 to 0.2. The MOS semiconductor device further includes, in the breakdown withstanding region thereof, a plurality of guard rings, the number of which is equal to or more than the number n calculated from the following equation n=(Breakdown voltage Vbr (V))/100, and the spacing between the adjacent guard rings is set at 1 μm or less.
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Abe Hitoshi
Fujihira Tatsuhiko
Inoue Masanori
Kobayashi Takashi
Niimura Yasushi
Flynn Nathan J.
Fuji Electric Device Technology Co., LTD
Mandala Jr. Victor A.
Rossi, Kimms & McDowell
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