Method and system for monitoring a semiconductor device...

Details Method and system for monitoring a semiconductor device... Method and system for monitoring a semiconductor device...

2005-06-21

2005-06-21

Gandhi, Jayprakash N. (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S095000, C700S117000, C438S473000, C250S492200, C716S030000

Reexamination Certificate

active

06909930

ABSTRACT:
To realize a method for detecting variations in conditions (drift of the exposure and drift of the focus) in exposure equipment at a product wafer level in lithography process, the process is specified in such a way that calculation results of feature quantities such as electron beam images, line profiles, dimensions, etc. under various sets of the exposure and the focus are stored as a library, and an electron beam image of the product wafer is compared with these pieces of data in the library so that detection of drifts of the exposure and the focus a check of the results on the screen can easily be performed.

REFERENCES:
patent: 4212031 (1980-07-01), Schmitt et al.
patent: 4567364 (1986-01-01), Kano et al.
patent: 6329826 (2001-12-01), Shinada et al.
patent: 6614923 (2003-09-01), Shishido et al.
patent: 2002/0117635 (2002-08-01), Shinada et al.
patent: 0898300 (1999-02-01), None

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