Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-08-23
2005-08-23
Thornton, Yvette C. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S286100, C430S287100, C430S322000, C430S330000, C430S907000, C430S966000, C430S945000
Reexamination Certificate
active
06933095
ABSTRACT:
A copolymer of an acrylate monomer containing fluorine at α-position with a fluorinated hydroxystyrene derivative is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, resolution, transparency, substrate adhesion and plasma etching resistance, and is suited for lithographic microprocessing.
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Endo Masayuki
Harada Yuji
Hatakeyama Jun
Kawai Yoshio
Kishimura Shinji
Central Glass Co. Ltd.
Matsushita Electric - Industrial Co., Ltd.
Millen White Zelano & Branigan P.C.
Shin-Etsu Chemical Co. , Ltd.
Thornton Yvette C.
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