Semiconductor device fabricated on surface of silicon having...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S410000, C438S198000, C438S788000, C438S792000

Reexamination Certificate

active

06903393

ABSTRACT:
In a semiconductor device in which a plurality of field effect transistors are formed on a silicon surface having substantially a <110> orientation, the field effect transistors are disposed on the silicon surface such that a direction connecting a source region and a drain region of the field effect transistor is coincident to a substantially <110> direction.

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patent: WO 00/60671 (2000-12-01), None
Hirayama, M., et al., Low-Temperature Growth of High-Integrity Silicon Oxide Films by Oxygen Radical Generated in High-Density Krypton Plasma, IEEE IEDM Tech. Digest, Dec. 1999, pp. 249-252.
Wolf, et al., Silicon Processing for the VLSI Era, Vol. 1, Process Technology, 1986, Lattice Press, pp. 182-211.

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