Methods of forming via plugs using an aerosol stream of...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

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C438S675000, C438S686000

Reexamination Certificate

active

06855631

ABSTRACT:
An aerosol stream of particles of a conductive material is directed into a via of an integrated circuit device to deposit the conductive material within the via to form a via plug.

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patent: 6288442 (2001-09-01), Farrar
patent: 6355533 (2002-03-01), Lee
patent: 6538323 (2003-03-01), Sakata et al.
patent: 20030194860 (2003-10-01), Nemoto
B. King, M. Renn and M Essien, M3D Technology, Maskless Mesoscale™ Materials Deposition, “M3D Technology deposits electronic materials onto low-temperature, non-planar substrates without masks or resists,” Optomec, Inc.
M3D, Maskless Mesoscale™ Materials Deposition, Optomec, Inc.

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