Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2005-02-15
2005-02-15
Smoot, Stephen W. (Department: 2813)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S675000, C438S686000
Reexamination Certificate
active
06855631
ABSTRACT:
An aerosol stream of particles of a conductive material is directed into a via of an integrated circuit device to deposit the conductive material within the via to form a via plug.
REFERENCES:
patent: 5343434 (1994-08-01), Noguchi
patent: 5529634 (1996-06-01), Miyata et al.
patent: 6042953 (2000-03-01), Yamaguchi et al.
patent: 6251488 (2001-06-01), Miller et al.
patent: 6288442 (2001-09-01), Farrar
patent: 6355533 (2002-03-01), Lee
patent: 6538323 (2003-03-01), Sakata et al.
patent: 20030194860 (2003-10-01), Nemoto
B. King, M. Renn and M Essien, M3D Technology, Maskless Mesoscale™ Materials Deposition, “M3D Technology deposits electronic materials onto low-temperature, non-planar substrates without masks or resists,” Optomec, Inc.
M3D, Maskless Mesoscale™ Materials Deposition, Optomec, Inc.
Leffert Jay & Polglaze P.A.
Micro)n Technology, Inc.
Smoot Stephen W.
LandOfFree
Methods of forming via plugs using an aerosol stream of... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Methods of forming via plugs using an aerosol stream of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods of forming via plugs using an aerosol stream of... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3484856