Positive resist composition

Details Positive resist composition Positive resist composition

2005-11-29

2005-11-29

Thornton, Yvette C. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S910000, C430S326000

Reexamination Certificate

active

06969577

ABSTRACT:
A positive resist composition comprising (A) a resin having a specific structure and capable of decomposing under action of an acid to increase solubility in an alkali developer, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.

REFERENCES:
patent: 5856071 (1999-01-01), Kotachi et al.
patent: 6565763 (2003-05-01), Asakawa et al.
patent: 6632582 (2003-10-01), Kishimura et al.
patent: 6830870 (2004-12-01), Malik et al.
patent: 7-99435 (1995-10-01), None
patent: 2002-256033 (2002-09-01), None
patent: 2001-305737 (2002-11-01), None
patent: WO 02/073308 (2002-09-01), None
Machine translation of JP 2002-256033.

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