Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate
2005-11-01
2005-11-01
Smoot, Stephen W. (Department: 2813)
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
C438S710000, C438S715000, C438S732000, C438S778000
Reexamination Certificate
active
06960528
ABSTRACT:
Nanotip arrays are formed by exposing a substrate to a process gas mixture that simultaneously forms nanomasks on the substrate surface and etches exposed portions of the substrate surface to form the nanotip array. Components of the process gas mixture form nanocrystallites on the surface of the substrate, thereby masking portions of the substrate from other components of the process gas mixture, which etch exposed portions of the substrate. Accordingly, nanotip arrays formed using this technique can have nanocrytallite endpoints.
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Chen Kuie-Hsien
Chen Li-Chyong
Das Debajyoti
Hwang Jih Shang
Lo Hong Chun
Academia Sinica
Fish & Richardson P.C.
Smoot Stephen W.
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