Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-02-22
2005-02-22
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S905000, C430S910000
Reexamination Certificate
active
06858370
ABSTRACT:
A positive photosensitive composition comprises: (A) an acid generator capable of generating an acid upon irradiation with one of an actinic ray and a radiation; and (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and capable of decomposing by the action of an acid to increase the solubility in an alkali developer, wherein the acid generator (A) comprises at least two compounds of a sulfonium salt compound not having an aromatic ring, a triarylsulfonium salt compound, and a compound having a phenacylsulfonium salt structure.
REFERENCES:
patent: 6159656 (2000-12-01), Kawabe et al.
patent: 6511787 (2003-01-01), Harada et al.
patent: 6596458 (2003-07-01), Sato et al.
patent: 6630280 (2003-10-01), Fujimori et al.
patent: 6692884 (2004-02-01), Fujimori et al.
patent: 6699635 (2004-03-01), Kodama et al.
patent: 6787283 (2004-09-01), Aoai et al.
patent: 1 041 442 (2000-04-01), None
patent: 2000-275845 (2000-10-01), None
patent: 2000-292917 (2000-10-01), None
Kodama Kunihiko
Sato Kenichiro
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