Abrading – Abrading process – Glass or stone abrading
Reexamination Certificate
2005-02-01
2005-02-01
Rose, Robert A. (Department: 3723)
Abrading
Abrading process
Glass or stone abrading
C451S057000
Reexamination Certificate
active
06848976
ABSTRACT:
In chemical mechanical polishing, a substrate is planarized with one or more fixed-abrasive polishing pads. Then the substrate is polished with a standard polishing pad to remove scratch defects created by the fixed-abrasive polishing pads.
REFERENCES:
patent: 3841031 (1974-10-01), Walsh
patent: 5152917 (1992-10-01), Pieper et al.
patent: 5244534 (1993-09-01), Yu et al.
patent: 5342419 (1994-08-01), Hibbard
patent: 5378251 (1995-01-01), Culler et al.
patent: 5395801 (1995-03-01), Doan et al.
patent: 5514245 (1996-05-01), Doan et al.
patent: 5676587 (1997-10-01), Landers et al.
patent: 5718618 (1998-02-01), Guckel et al.
patent: 5738574 (1998-04-01), Tolles et al.
patent: 5752875 (1998-05-01), Ronay
patent: 5823855 (1998-10-01), Robinson
patent: 5876268 (1999-03-01), Lamphere et al.
patent: 5897426 (1999-04-01), Somekh
patent: 5972792 (1999-10-01), Hudson
patent: 6007407 (1999-12-01), Rutherford et al.
patent: 6083840 (2000-07-01), Mravic
patent: 6099389 (2000-08-01), Nichols et al.
patent: 6435945 (2002-08-01), Somekh
patent: 6582282 (2003-06-01), Somekh
patent: 0 318 135 (1989-05-01), None
patent: 03092264 (1991-04-01), None
Applied Materials Inc.
Fish & Richardson
Rose Robert A.
LandOfFree
Chemical mechanical polishing with multiple polishing pads does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Chemical mechanical polishing with multiple polishing pads, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical mechanical polishing with multiple polishing pads will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3477236