Metal working – Method of mechanical manufacture – Assembling or joining
Reexamination Certificate
2005-12-06
2005-12-06
Bryant, David P. (Department: 3726)
Metal working
Method of mechanical manufacture
Assembling or joining
C029S459000, C029S527100
Reexamination Certificate
active
06971151
ABSTRACT:
The invention encompasses a method of treating a physical vapor deposition target. The target has a sputtering surface and a sidewall edge at a periphery of the sputtering surface. The method comprises pressing a tool against the sidewall edge to form a distribution of imprints in the sidewall edge of the target. The tool is then removed from the sidewall edge, leaving the imprints extending into the sidewall edge. The invention also encompasses a physical vapor deposition target. The target includes a sputtering surface having an outer periphery, and a sidewall edge along the outer periphery of the sputtering surface. The sidewall edge has a repeating pattern of imprints extending therein.
REFERENCES:
patent: 3530881 (1970-09-01), Lester
patent: 3985635 (1976-10-01), Adam et al.
patent: 4551216 (1985-11-01), Argyo
patent: 4855033 (1989-08-01), Hurwitt
patent: 5269894 (1993-12-01), Kerschbaumer
patent: 5282943 (1994-02-01), Lannutti et al.
patent: 5336386 (1994-08-01), Marx et al.
patent: 5538603 (1996-07-01), Guo
patent: 5589040 (1996-12-01), Nishimura
patent: 5632869 (1997-05-01), Hurwitt et al.
patent: 5658442 (1997-08-01), Van Gogh et al.
patent: 5753090 (1998-05-01), Obinata
patent: 5755887 (1998-05-01), Sano et al.
patent: 6086735 (2000-07-01), Gilman et al.
patent: 6162297 (2000-12-01), Mintz et al.
patent: 06 306597 (1994-11-01), None
patent: 2001-316798 (2001-11-01), None
patent: WO 98/31845 (1998-07-01), None
patent: 01/32018 (2001-11-01), None
Bryant David P.
Honeywell International , Inc.
Kenny Stephen
Wells St. John P.S.
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