Photosensitive polymer containing silicon and a resist...

Details Photosensitive polymer containing silicon and a resist... Photosensitive polymer containing silicon and a resist...

2005-02-01

2005-02-01

Kelly, Cynthia H. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S910000, C430S914000, C430S921000, C430S925000, C430S326000, C526S266000, C526S270000, C526S271000, C526S279000

Reexamination Certificate

active

06849382

ABSTRACT:
A photosensitive polymer including silicon and a resist composition using the same are disclosed. The photosensitive polymer has the following formula 1.In formula 1, R1of the first monomer and R3of the third monomer are an alkyl group. R2of the first monomer is hydrogen, alkyl, alkoxy, or carbonyl. The X of the first monomer is an integer selected from 1 to 4. Further, m/(m+n+p) is about 0.1 to about 0.4, n/(m+n+p) is about 0.1 to about 0.5, and p/(m+n+p) is about 0.1 to about 0.4.

REFERENCES:
patent: 6051362 (2000-04-01), Choi et al.
patent: 20040137363 (2004-07-01), Choi et al.

Affiliated with

Also associated with

Rating

Photosensitive polymer containing silicon and a resist... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive polymer containing silicon and a resist..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive polymer containing silicon and a resist... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3470620