Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-02-15
2005-02-15
Ashton, Rosemary (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S905000, C430S907000
Reexamination Certificate
active
06855475
ABSTRACT:
Disclosed are photoresist compositions suitable for imaging with sub 200 nm wavelength radiation including as polymerized units one or more monomers having an electronegative substituent and an ester group containing certain leaving groups. Also disclosed are methods of providing photoresist relief images using the photoresist compositions.
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Ito et al., “Polymer design for 157 nm chemically amplified resists”, Advances in Resist Technology and Processing XVIII; Santa Clara, CA, U.S., Feb. 26-28, 2001; vol. 4345, No. I, 2001, pp. 273-284, XP002209442; Proc. SPIE Int. Soc. Opt Eng; Proceeings of SPIE—The International Society for Optical Engineering 2001.
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Ashton Rosemary
Frickey Darryl P.
Shipley Company L.L.C.
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