Resist composition

Details Resist composition Resist composition

2005-06-07

2005-06-07

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S326000, C430S914000

Reexamination Certificate

active

06902862

ABSTRACT:
A negative type resist composition comprising:(A1) a compound generating a sulfonic acid upon irradiation with actinic rays or a radiation and having the specific formula,(A2) a compound generating a sulfonic acid upon irradiation with actinic rays or a radiation and having the specific structure,(B) an alkali-soluble resin, and(C) a crosslinking agent capable of carrying out an addition reaction with the alkali-soluble resin which is the component (B) by the action of an acid.

REFERENCES:
patent: 5089374 (1992-02-01), Saeva
patent: 6558871 (2003-05-01), Takahashi et al.
patent: 10-039500 (1998-02-01), None
patent: 2968055 (1999-08-01), None
patent: 2001-142200 (2001-05-01), None

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