Photosensitive composition and negative working lithographic...

Details Photosensitive composition and negative working lithographic... Photosensitive composition and negative working lithographic...

2005-02-22

2005-02-22

Gilliam, Barbara L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S282100, C430S283100, C430S284100, C430S285100, C430S286100, C430S287100, C430S494000, C430S944000, C430S945000, C430S964000

Reexamination Certificate

active

06858373

ABSTRACT:
A photosensitive composition comprising a resin containing a repeating unit corresponding to a monomer having a structure represented by formula (I) defined in the specification, and a negative working lithographic printing plate having a negative working photosensitive layer comprising the above-described photosensitive composition.

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patent: 6476092 (2002-11-01), Kunita
patent: 6551757 (2003-04-01), Bailey et al.
patent: 6716565 (2004-04-01), Kunita et al.
patent: 20010054363 (2001-12-01), Nakazawa et al.
patent: 20030008996 (2003-01-01), Kunita
patent: 20030084806 (2003-05-01), Kunita et al.

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