Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2005-11-29
2005-11-29
Loke, Steven (Department: 2811)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S368000, C257S369000, C257S371000, C257S374000, C257S506000, C257S392000, C257S314000, C257S355000, C257S341000, C257S401000, C257S296000, C257S390000, C257S342000, C257S391000, C257S510000, C438S199000, C438S221000, C438S223000
Reexamination Certificate
active
06969893
ABSTRACT:
There is provided a semiconductor device of low power consumption and high reliability having DTMOS' and substrate-bias variable transistors, and portable electronic equipment using the semiconductor device. On a semiconductor substrate (11), trilayer well regions (12, 14, 16; 13, 15, 16) are formed, and DTMOS' (29, 30) and substrate-bias variable transistors (27, 28) are provided in the shallow well regions (16, 17). Large-width device isolation regions (181, 182, 183) are provided at boundaries forming PNP, NPN or NPNP structures, where a small-width device isolation region (18) is provided on condition that well regions on both sides are of an identical conductive type. Thus, a plurality of well regions of individual conductive types where substrate-bias variable transistors (27, 28) of individual conductive types are provided can be made electrically independent of one another, allowing the power consumption to be reduced. Besides, the latch-up phenomenon can be suppressed.
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Iwata Hiroshi
Kakimoto Seizo
Shibata Akihide
Birch & Stewart Kolasch & Birch, LLP
Im Junghwa
Loke Steven
Sharp Kabushiki Kaisha
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