Micromirror unit and method of making the same

Details Micromirror unit and method of making the same Micromirror unit and method of making the same

2005-05-03

2005-05-03

Norton, Nadine G. (Department: 1765)

Etching a substrate: processes

Gas phase etching of substrate

C216S060000, C216S067000, C216S074000, C216S079000

Reexamination Certificate

active

06887396

ABSTRACT:
A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.

REFERENCES:
patent: 6229640 (2001-05-01), Zhang
patent: 6232861 (2001-05-01), Asada
patent: 6392220 (2002-05-01), Slater et al.
patent: 7-287177 (1995-10-01), None
patent: 9-146032 (1997-06-01), None
patent: 9-146034 (1997-06-01), None
patent: 10-62709 (1998-03-01), None
patent: 2000-13443 (2000-01-01), None

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