Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2005-10-25
2005-10-25
Nelms, David (Department: 2818)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S327000, C257S347000, C257S618000
Reexamination Certificate
active
06958512
ABSTRACT:
A non-volatile memory device includes a substrate, an insulating layer, a fin, a conductive structure and a control gate. The insulating layer may be formed on the substrate and the fin may be formed on the insulating layer. The conductive structure may be formed near a side of the fin and the control gate may be formed over the fin. The conductive structure may act as a floating gate electrode for the non-volatile memory device.
REFERENCES:
patent: 5411905 (1995-05-01), Acovic et al.
patent: 6657252 (2003-12-01), Fried et al.
patent: 6768158 (2004-07-01), Lee et al.
patent: 2002/0072170 (2002-06-01), Lam
patent: 2002/0137271 (2002-09-01), Forbes et al.
patent: 2003/0178670 (2003-09-01), Fried et al.
Copy of co-pending U.S. Appl. No. 10/929,538, Yu et al., filed Aug. 31, 2004, entitled “Non-Volatile Memory Device”, 25 pages.
Digh Hisamoto et al., “FinFET-A Self-Aligned Double-Gate MOSFET Scalable to 20 nm,” IEEE Transactions on Electron Devices, vol. 47, No. 12, Dec. 2000, pp. 2320-2325.
Yang-kyu Choi et al., “Sub-20nm CMOS FinFET Technologies,” 2001 IEEE, IEDM, pp. 421-424.
Xuejue Huang et al., “Sub-50 nm P-Channel FinFET, ” IEEE Transactions on Electron Devices, vol. 48, No. 5, May 2001, pp. 880-886.
Xuejue Huang et al., “Sub 50-nm FinFET: PMOS,” 1999 IEEE, IEDM, pp. 67-70.
Yang-Kyu Choi et al., “Nanoscale CMOS Spacer FinFET for the Terabit Era,” IEEE Electron Device Letters, vol. 23, No. 1, Jan. 2002, pp. 25-27.
Ahmed Shibly S.
Wang Haihong
Wu Yider
Yu Bin
Advanced Micro Devices , Inc.
Harrity & Snyder LLP
Ho Tu-Tu
Nelms David
LandOfFree
Non-volatile memory device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Non-volatile memory device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Non-volatile memory device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3452125