Resist with reduced line edge roughness

Details Resist with reduced line edge roughness Resist with reduced line edge roughness

2005-08-30

2005-08-30

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S286100, C526S242000

Reexamination Certificate

active

06936398

ABSTRACT:
Novel photoresists containing at least about 0.2 molar ratio of a base with respect to the concentration of a photoacid generator present and their preparation are described. It has been discovered that inclusion of a sufficient amount of base counteracts the detrimental effects of photoacid generators, thus providing resists having submicron linewidth resolution.

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