Resist compositions and patterning process

Details Resist compositions and patterning process Resist compositions and patterning process

2005-03-15

2005-03-15

Thornton, Yvette C. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S907000, C430S322000, C430S330000, C526S242000

Reexamination Certificate

active

06866983

ABSTRACT:
A resist composition comprising a blend of a polymer comprising recurring units k and m of formula (1) wherein R1and R2each are hydrogen or an acid labile group, 0<k<1, 0<m<1 and 0<k+m≦1, and another polymer comprising recurring units having carboxyl groups whose hydrogen atoms are replaced by acid labile groups as a base resin forms a resist film which is improved in transparency, alkali dissolution contrast and plasma etching resistance.

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