Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Physical stress responsive
Reexamination Certificate
2005-01-25
2005-01-25
Zarabian, Amir (Department: 2822)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Physical stress responsive
C438S050000, C438S106000, C438S110000, C438S113000, C438S458000, C438S459000, C438S460000, C438S464000, C438S977000
Reexamination Certificate
active
06846692
ABSTRACT:
A method of fabricating devices incorporating microelectromechanical systems (MEMS) using UV curable tapes includes providing a silicon substrate12with a MEMS layer14arranged on one side of the substrate12. A first UV curable tape22is applied to the MEMS layer14. At least one operation is performed on the substrate14via an opposed side of the substrate14. A second UV curable tape32is applied to the opposed side of the substrate14and the first tape22is removed by exposing it to UV light. At least one operation is performed on the MEMS layer to form individual MEMS chips which are able to be removed individually from the second UV tape32by localised exposure of the tape32to UV light.
REFERENCES:
patent: 4822755 (1989-04-01), Hawkins et al.
patent: 5187007 (1993-02-01), Ebe et al.
patent: 5476566 (1995-12-01), Cavasin
patent: 5605489 (1997-02-01), Gale et al.
patent: 5923995 (1999-07-01), Kao et al.
patent: 6010782 (2000-01-01), Uemura et al.
patent: 6025251 (2000-02-01), Jakowetz et al.
patent: 6184109 (2001-02-01), Sasaki et al.
patent: 6245593 (2001-06-01), Yoshihara et al.
patent: 6297131 (2001-10-01), Yamada et al.
patent: 6320266 (2001-11-01), Hatchard
patent: 6425971 (2002-07-01), Silverbrook
patent: 6492195 (2002-12-01), Nakanishi et al.
patent: 07 022358 (1995-01-01), None
patent: 08-281954 (1996-10-01), None
patent: 11-204551 (1999-07-01), None
patent: WO 0185600 (2001-11-01), None
Duong Khanh
Silverbrook Research Pty Ltd.
Zarabian Amir
LandOfFree
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