Photoresist processing aid and method

Details Photoresist processing aid and method Photoresist processing aid and method

2005-05-31

2005-05-31

Le, Hoa Van (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

C510S466000

Reexamination Certificate

active

06900003

ABSTRACT:
A composition and method to reduce photolithographic residue and scum formation on a substrate or in a solution, and to reduce or prevent foam formation. The composition contains a diphenyl oxide compound in combination with an antifoam agent. The composition may be added to developer solutions and stripper solutions used in manufacturing printed wiring boards.

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