Resist material and exposure method

Details Resist material and exposure method Resist material and exposure method

2005-04-19

2005-04-19

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S905000, C430S907000

Reexamination Certificate

active

06881531

ABSTRACT:
An exposure method comprising a step of subjecting a resist layer to selective exposure to an ultraviolet light and forming a predetermined pattern in the resist layer, wherein a polymer material having introduced thereinto a cyclohexane group is used as a polymer material constituting the resist layer wherein all hydrogen atoms bonded to four continuously adjacent carbon atoms in the cyclohexane group are substituted by fluorine atoms. The use of a polymer material having a lowered absorption in the wavelength range of a vacuum ultraviolet (VUV) light in the resist material or resist layer enables a more improved ultra-fine processing than before.

REFERENCES:
patent: wo 2002090423 (2002-11-01), None
WO 200290423, Nov. 2002 Derwent Abstract.

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