Resist compositions and patterning process

Details Resist compositions and patterning process Resist compositions and patterning process

2005-04-05

2005-04-05

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S907000, C430S910000

Reexamination Certificate

active

06875556

ABSTRACT:
A resist composition comprising as the base resin a blend of a fluorinated polymer which is sensitive to high-energy radiation and highly transparent at a wavelength of up to 200 nm and a sulfonate-containing polymer exhibiting a high contrast upon alkali dissolution is improved in transparency and alkali dissolution contrast as well as plasma etching resistance.

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Ito et al., Proc. SPIE, vol. 4345, pp. 273-284 (2001).
Kodama et al., Proc. SPIE, vol. 4690, pp. 76-83 (2002).

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