Exposure method and apparatus

Details Exposure method and apparatus Exposure method and apparatus

1991-10-01

1992-07-14

Howell, Janice A.

X-ray or gamma ray systems or devices

Specific application

Lithography

2504922, 430 30, G21K 500

Patent

active

051310228

ABSTRACT:
An exposure apparatus for lithographically transferring a pattern of a mask onto a workpiece coated with a radiation sensitive material includes a first filter made the same material as of the substrate of the mask, a second filter formed by a base member made of the same material as the mask substrate and being coated with a radiation sensitive material, an illuminometer for measuring illuminance of light passed through the first and second filters, respectively, and a control device for determining an exposure time for lithographic transfer of the pattern of the mask onto the wafer, on the basis of a difference between a measured value as measured through the first filter and a measured value as measured through the second filter.

REFERENCES:
patent: 4707124 (1987-11-01), Hickey et al.
patent: 4825453 (1989-04-01), Kembo et al.

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