Positive photosensitive compositions

Details Positive photosensitive compositions Positive photosensitive compositions

2005-01-18

2005-01-18

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000

Reexamination Certificate

active

06844132

ABSTRACT:
A positive photosensitive composition comprising (A) a compound capable of generating a fluorine-substituted alkanesulfonic acid having 2 to 4 carbon atoms by irradiation of actinic rays or radiation, (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and being decomposed by the action of an acid to increase solubility in an alkali developer, (C) a basic compound, and (D) a fluorine and/or silicon surfactant.

REFERENCES:
patent: 1 041 442 (2000-10-01), None
patent: 2000-275845 (2000-10-01), None
patent: 2000-292917 (2000-10-01), None
Kodama et al., US 2003/0017415 A1, 1-23-2-03.

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