Positive photosensitive resin composition, positive...

Details Positive photosensitive resin composition, positive... Positive photosensitive resin composition, positive...

2005-03-08

2005-03-08

Thornton, Yvette C. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S258000, C430S260000, C430S326000

Reexamination Certificate

active

06864035

ABSTRACT:
The present invention provides a positive photosensitive resin composition comprising (A) a positive photosensitive resin, (B) a photoacid generator and (C) a photosensitizer which is a benzopyran condensed ring compound capable of increasing photosensitivity to visible light with a wavelength of 480 nm or more;a positive photosensitive dry film prepared by applying the photosensitive resin composition to a surface of support film, followed by drying, to form a photosensitive resin layer; anda method of forming a pattern using the resin composition or the dry film.

REFERENCES:
patent: 5496678 (1996-03-01), Imai et al.
patent: 5801212 (1998-09-01), Okamoto et al.
patent: 6033826 (2000-03-01), Urano et al.
patent: 6072006 (2000-06-01), Bantu et al.
patent: 6140025 (2000-10-01), Imai et al.
patent: 6277541 (2001-08-01), Uno et al.
patent: 6555286 (2003-04-01), Imai et al.
patent: 09-138502 (1997-05-01), None
patent: 2000-035665 (2000-02-01), None
patent: 2000-056450 (2000-02-01), None
JPO machine translation of Ichimura et al.( JP 2000-035665).*
JPO machine translation of Makoto et al.( JP 09-138502).*
International Search Report dated Dec. 25, 2001.

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