Porous material air bearing platen for chemical mechanical...

Details Porous material air bearing platen for chemical mechanical... Porous material air bearing platen for chemical mechanical...

2005-09-06

2005-09-06

Eley, Timothy V. (Department: 3724)

Abrading

Frame or mount

C451S442000, C451S490000

Reexamination Certificate

active

06939212

ABSTRACT:
A platen for use in chemical mechanical planarization (CMP) systems includes a platen plate that has at least one recess defined therein. The at least one recess has an input port formed therein. A porous material is disposed in the at least one recess. The porous material has a porosity sufficient to restrict air flow therethrough so as to reduce an amount of air required for a CMP operation.

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