Method of generating an IC mask using a reduced database

Details Method of generating an IC mask using a reduced database Method of generating an IC mask using a reduced database

2005-03-15

2005-03-15

Do, Thuan (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000

Reexamination Certificate

active

06868537

ABSTRACT:
For IC devices that have repeating structures, a method of generating a database for making a mask layer starts with a hierarchical database describing at least one repeating element in the layer, a skeleton that surrounds the repeating elements, and instructions as to where to locate the repeating elements within the skeleton. This database is modified to generate a database that has optical proximity correction (OPC) for diffraction of light that will pass through the mask and expose photoresist on the IC layer. The optical-proximity corrected mask database is fractured by a mask house using instructions on how the modified data base will be divided to form repeating elements that are still identical after OPC, a mask skeleton that includes non-repeating elements, and instructions for placement of the repeating elements in the skeleton. Thus the resulting mask database is smaller than a mask database that includes all copies of repeating elements.

REFERENCES:
patent: 5879844 (1999-03-01), Yamamoto et al.
patent: 6430737 (2002-08-01), Cobb et al.
patent: 20020026260 (2002-02-01), Tomita
patent: 20020157068 (2002-10-01), LaCourt et al.
patent: 20020166109 (2002-11-01), Rittman et al.

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