Silicon on insulator (SOI) transistor and methods of...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S279000

Reexamination Certificate

active

06919238

ABSTRACT:
The present invention is a silicon on insulator (SOI) transistor and its method of fabrication. According to the present invention, an opening is formed in the insulating layer formed on a single crystalline silicon substrate. An amorphous or polycrystalline silicon or silicon alloy is then formed in the opening on the single crystalline silicon substrate and on the insulating layer. The amorphous or polycrystalline silicon or silicon alloy in the opening and at least a portion of the amorphous or polycrystalline silicon or silicon alloy on the insulating layer is crystallized into a single crystalline silicon or silicon alloy film.

REFERENCES:
patent: 4381202 (1983-04-01), Mori et al.
patent: 4467518 (1984-08-01), Bansal et al.
patent: 4489478 (1984-12-01), Sakurai
patent: 5273921 (1993-12-01), Neudeck et al.
patent: 5278093 (1994-01-01), Yonehara
patent: 5318663 (1994-06-01), Buti et al.
patent: 5670387 (1997-09-01), Sun
patent: 5849612 (1998-12-01), Takahashi et al.
patent: 6040200 (2000-03-01), Hayashi et al.
patent: 6391695 (2002-05-01), Yu
patent: 2001/0001716 (2001-05-01), Joo et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Silicon on insulator (SOI) transistor and methods of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silicon on insulator (SOI) transistor and methods of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon on insulator (SOI) transistor and methods of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3409135

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.