Electron diffraction system for use in production...

Details Electron diffraction system for use in production... Electron diffraction system for use in production...

2005-01-11

2005-01-11

Lee, John R. (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

C250S306000, C250S307000, C250S492100, C250S492200, C250S492300

Reexamination Certificate

active

06841777

ABSTRACT:
An electron source particularly for a RHEED measurement system or a RHEED measurement system as such includes an electron emitter (5), a first deflection stage (6a, b) for radiating an electron beam onto a sample (1), and a second deflection stage between the first stage (6a, b) and the sample1, preferably near the sample.

REFERENCES:
patent: 3609432 (1971-09-01), Shimula
patent: 3777211 (1973-12-01), Kuijpers
patent: 4119855 (1978-10-01), Bernacki
patent: 4952814 (1990-08-01), Huntzinger
patent: 5200618 (1993-04-01), Saldin et al.
patent: 5235239 (1993-08-01), Jacob et al.
patent: 5335258 (1994-08-01), Whitlock
patent: 5347126 (1994-09-01), Krauss et al.
patent: 5466933 (1995-11-01), Bryson et al.
patent: 6326634 (2001-12-01), Robinson
patent: 6492644 (2002-12-01), Staib
patent: 6576908 (2003-06-01), Winkler et al.
patent: 6677581 (2004-01-01), Koinuma et al.
patent: 20040065844 (2004-04-01), Staib
patent: 1 113 482 (2001-07-01), None
Rijnders et al., “In situ monitoring during pulsed laser deposition of complex oxides using reflection high energy electron diffraction under high oxygen pressure,”Appl. Phys. Lett., vol. 70, No. 14, pps. 1888-1890 (Apr. 7, 1997).

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