Method of fabricating thin film transistor

Details Method of fabricating thin film transistor Method of fabricating thin film transistor

2005-07-26

2005-07-26

Lee, Hsien-Ming (Department: 2823)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S151000, C438S160000, C438S164000, C438S166000

Reexamination Certificate

active

06921685

ABSTRACT:
A method of fabricating a thin film transistor includes the steps of (a) forming an amorphous silicon film containing hydrogen therein, on a substrate composed of resin, and (b) irradiating laser beams to the amorphous silicon film at an intensity equal to or smaller than a threshold intensity at which the amorphous silicon film is crystallized. For instance, the step (a) includes the steps of forming the amorphous silicon film on the resin substrate by sputtering, and doping hydrogen ions into the amorphous silicon film.

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