Evaluation mask, focus measuring method and aberration...

Photocopying – Projection printing and copying cameras – Focus or magnification control

Reexamination Certificate

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C355S053000, C355S077000

Reexamination Certificate

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06940585

ABSTRACT:
An evaluation mask for evaluating a projection-type exposure apparatus, the mask including at least one diffraction grating pattern for producing a diffracted light of the positive first-order and a diffracted light of negative first-order, diffraction efficiencies of the diffracted lights being different respectively, one of the diffracted lights having a magnitude that is zero, and an image of the at least one diffraction grating pattern being projected onto a test substrate by the projection-type exposure apparatus, and a reference pattern for obtaining a reference image to measure a displacement of the image of the diffraction grating pattern, and an image of the reference pattern being projected onto the test substrate or the image detector by the projection-type exposure apparatus, wherein the images of the diffraction grating pattern and the reference pattern projected onto the test substrate or the image detector are used for evaluating the projection-type exposure apparatus.

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T.A. Brunner et al., “Quantitative Stepper Metrology using the Focus Monitor Test Mask”, Optical/Laser Microlithography VII, Timothy A. Brunner ed., Proc. SPIE, vol. 2197, pp 541-549 (1994).
J.P. Kirk et al., “Application of Blazed Gratings for Determination of Equivalent Primary Azimuthal Aberrations”, Optical Microlithography XII, Luc Van den Hove ed., Proc. SPIE. vol. 3679, 70-76 (1999).
Kirk, “Astigmatism and Field Curvature from Pin-Bars,” Mar. 6-8, 1991, SPIE, 1463:282-291.

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