Electrostatic attraction mechanism, surface processing...

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C361S233000

Reexamination Certificate

active

06922325

ABSTRACT:
Electrostatic attraction is performed on a plate-shaped object9in that an attraction power source3applies a voltage to a pair of attraction terminals23, 24mounted inside a dielectric block22, the surface of which is an attraction surface, thereby inducing static electricity in an attraction surface. The attraction power source3adjusts the surface potential of a plate-shaped object9by independently controlling voltages applied to the respective attraction terminals23, 24. Processing is carried out on the surface of the plate-shaped object9while the injection of charged particles into the plate-shaped object9is suppressed. A control part6which controls the attraction power source3records, in a recording part62, data obtained by measuring in advance the surface potential of the plate-shaped object9while respectively changing the voltage applied to the attraction terminals23, 24, and controls the attraction power source3with a pattern selected in accordance with this data.

REFERENCES:
patent: 5646814 (1997-07-01), Shamouilian et al.
patent: 5880924 (1999-03-01), Kumar et al.
patent: 5958265 (1999-09-01), Ogahara
patent: 63-310965 (1988-12-01), None
patent: 09-087839 (1997-03-01), None
patent: 10-163308 (1998-06-01), None
patent: 11-195260 (1999-07-01), None
Electrostatic Clamping Applied to Semiconductor Plasma Processing,J. Electrochem. Soc., vol. 140, No. 11, Nov. 1993, The Electrochemical Society, Inc., pp. 3245-3255.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electrostatic attraction mechanism, surface processing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrostatic attraction mechanism, surface processing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrostatic attraction mechanism, surface processing... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3398369

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.