Silicon-containing polymer, resist composition and...

Details Silicon-containing polymer, resist composition and... Silicon-containing polymer, resist composition and...

2005-07-19

2005-07-19

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S311000, C252S500000, C524S262000

Reexamination Certificate

active

06919161

ABSTRACT:
Silicon-containing polymers comprising recurring units of formula (1) are novel wherein R1is a single bond or alkylene, R2is hydrogen or alkyl, R3, R4and R5are alkyl, haloalkyl, aryl or silicon-containing group, R6is hydrogen, methyl, cyano or —C(═O)OR8wherein R8is hydrogen, alkyl or acid labile group, R7is alkyl, —NR9R10or —OR11wherein R9, R10and R11are hydrogen or alkyl, a and b are positive numbers satisfying 0<a+b≦1. Resist compositions comprising the polymers are sensitive to high-energy radiation and have a high sensitivity and resolution at a wavelength of less than 300 nm and improved resistance to oxygen plasma etching.

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