Surface treatment method, surface-treated substrate, method...

Details Surface treatment method, surface-treated substrate, method... Surface treatment method, surface-treated substrate, method...

2005-03-01

2005-03-01

Zarabian, Amir (Department: 2822)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S149000, C438S758000

Reexamination Certificate

active

06861377

ABSTRACT:
The invention provides a surface treatment method by which a substrate with desired uniform lyophilicity is obtained in order to enhance the formation of a film pattern by an ink-jet process; a surface-treated substrate obtained by the surface treatment; and a method of forming a film pattern.A surface of a substrate is subjected to lyophobic treatment by forming a self-assembled layer composed of organic molecules. The lyophobicity is then modified by ultraviolet irradiation or the like to obtain desired lyophobicity.

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