Measuring and testing – Vibration – By mechanical waves
Reexamination Certificate
2005-03-15
2005-03-15
Williams, Hezron (Department: 2856)
Measuring and testing
Vibration
By mechanical waves
C073S599000, C073S602000, C250S559420, C356S237500
Reexamination Certificate
active
06865948
ABSTRACT:
A source of ultrasound waves or energy is directed at the wafer that is to be inspected in a direction that is essentially perpendicular with the surface of the wafer. The ultrasonic waves are intercepted and analyzed after these waves have passed through the wafer that is being inspected. From this analysis and comparing the captured waves or ultrasonic energy with the emitted ultrasonic waves, conclusions can be drawn on defects and other irregularities that are present in the medium, that is the wafer, through which the ultrasonic waves have passed.
REFERENCES:
patent: 4011748 (1977-03-01), Bond et al.
patent: 4366713 (1983-01-01), Gilmore et al.
patent: 4741212 (1988-05-01), Rehwald
patent: 4803884 (1989-02-01), Kaneta et al.
patent: 5479252 (1995-12-01), Worster et al.
patent: 5592295 (1997-01-01), Stanton et al.
patent: 5797845 (1998-08-01), Barabash et al.
patent: 5955673 (1999-09-01), Leroy et al.
patent: 6045434 (2000-04-01), Fisher, Jr. et al.
patent: 6062084 (2000-05-01), Chang et al.
patent: 6188050 (2001-02-01), Duffer et al.
patent: 6356346 (2002-03-01), Hagen et al.
patent: 6545752 (2003-04-01), Swan et al.
Miller Rose M.
Williams Hezron
LandOfFree
Method of wafer edge damage inspection does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of wafer edge damage inspection, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of wafer edge damage inspection will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3389952